Pulsed Laser Deposition

Located in VKNRC N116 the PVD products PLD/MBE-2500 Pulsed Laser Deposition (PLD) system is one of the facility thin film deposition systems. The system is a versatile high performance system which allows for deposition in ultra-high vacuum, an inert gas environment or in a reactive gas environment, such as oxygen which is commonly used when depositing oxides. The system has the many features including:

Pulsed Laser Deposition System
Pulsed Laser Deposition System
  • Base pressure: ~ 1.5· 10 -8 Torr
  • Laser raster
  • 6 targets
  • Target rotation, raster
  • Substrate heating 950° C
  • In-situ RHEED thickness monitor
  • Load lock - 2 samples
  • substrate rotation
  • Combinatorial Films