AJA ATC-ORION 8000 E-beam Evaporation System
The AJA ATC-ORION 8000 E-beam evaporator is a performance UHV thin film deposition system. The system contains four material pockets for deposition of single and multi-layer films without breaking vacuum. The substrate holder can handle substrates up to 4 inches in diameter and allow simultaneous rotation. It also can be heated up to 850 °C in suitable environment. A load-lock chamber allows quick removal and insertion of samples without venting the chamber. The quartz crystal thickness monitor ensures the precise control of the deposited film thickness.
Equipment Specification:
- UHV conditions (Base pressure: ~ 3·10-9 Torr)
- 4 evaporation sources
- Max wafe size: 100mm (4 inch)
- Substrate rotation and heating (up to 850°C)
- Quartz crystal thickness monitor
Training Material:
| Pocket Position | 1 | 2 | 3 | 4 |
|---|---|---|---|---|
|
Target |
Ti | SiO2 | Au | Cr |
|
Group |
Hong | Xu | Hong and Dowben | Sinitskii |