Intlvac Nanoquest-I Ion Beam Etching and Milling System
![Inst-IBM_0.jpg](pictures/Inst-IBM_0.jpg)
Equipment Specification:
- Base vacuum: 8 x 10-9 Torr
- Ion beam energy: 100-1200 eV
- Two gridded ion sources: 4 and 14cm
- Three 100mm targets for ion beam sputtering
- 8 magnetron sputtering
- SIMS endpoint detector
- Maximum wafer size: 4 inches (100 mm)