SUSS MicroTec MJB4 Mask Aligner
The MJB4 mask aligner is an easy to use instrument for high-resolution photolithography. It is equipped with UV exposure optics and lamps that allow a sub-micro exposure in vacuum contact. The achievable adjustment accuracy in X, Y direction is below 1 µm. The versatile mask holder allows both round and square plates as masks, and the sample plate accommodates small and odd-shaped substrates. Masks and wafer/substrates to a total thickness of 9.00 mm can be processed. The system also features an infrared system for backside or buried layer alignment.
Equipment Specification
- High resolution printing down to 0.8µm
- Overlay accuracy up to 1 µm
- Fast and accurate alignment with SUSS Single-field Microscope
- Backside infrared alignment
- Substrate size up to 100mm
Available Resists
Positive Resists:
- Shipley S-1813
- AZ-3312
- SPR220-7.0
- LOR-3A
- PMGI SF5
- PMGI SF11
Negative Resists:
- MaN-1410