NCMN NanoFab Equipment - MJB4

SUSS MicroTec MJB4 Mask Aligner


The MJB4 mask aligner is an easy to use instrument for high-resolution photolithography. It is equipped with UV exposure optics and lamps that allow a sub-micro exposure in vacuum contact. The achievable adjustment accuracy in X, Y direction is below 1 µm. The versatile mask holder allows both round and square plates as masks, and the sample plate accommodates small and odd-shaped substrates. Masks and wafer/substrates to a total thickness of 9.00 mm can be processed. The system also features an infrared system for backside or buried layer alignment.

Equipment Specification
  • High resolution printing down to 0.8µm
  • Overlay accuracy up to 1 µm
  • Fast and accurate alignment with SUSS Single-field Microscope
  • Backside infrared alignment
  • Substrate size up to 100mm
Available Resists
Positive Resists:
  • Shipley S-1813
  • AZ-3312
  • SPR220-7.0
  • LOR-3A
  • PMGI SF5
  • PMGI SF11
Negative Resists:
  • MaN-1410
Training Material: