The Nanofabrication Cleanroom Facility at NCMN is to provide researchers with effective and efficient access to state-of-the-art nanofabrication equipment, expertise and training. Facility capabilities include high resolution patterning by electron-beam lithography (EBL) and photolithography, focused ion beams (FIB), reactive ion etching (RIE) process, wet chemical etching, as well as optical, stylus and eletronic characterization tools. Research collaborations are welcome from all university research groups as well as companies in Nebraska and elsewhere.

NanoFab Infrastructure

  • Certified class 10,000 (ISO-7)
  • 4,000 sq. ft. total area with 2,500 sq. ft. work space
  • Real time monitoring system



  • Stylus Profilometer (Dektak XT)
  • Reflective Film Thickness Measurement System (Filmetrics F40)
  • Optic Microscope with camera (Nikon Eclipse L200N)
  • Four-probe Resistivity Measurement Stand (Lucas 302)

Wafer Processing

  • Spinner (Laurell WS-400-6NPP)
  • Hot Plate (Super Nuova 120)
  • Oven (Thermo Scientific 3492M)
  • UltraSonic Cleaner (Brason 2510)