NCMN NanoFab Equipment - DWL66

Heidelberg DWL 66FS Laser Lithography system


The Heidelberg DWL 66FS laser lithography system is a high resolution pattern generator for low volume mask making and direct writing on wafers. Using the autofocus function and the interferometer controlled high precision stage, it can write structures down to 0.6 μm with an address grid of 50 nm and multilayer exposure with accuracy up to 200 nm. The system can expose nearly all photo-resists by using a variety of different lasers. The capabilities and flexibility of this system make it the ultimate lithographic research tool in MEMS, BioMEMS, Micro Optics, Micro Fluidics, Sensors and all other applications.

Equipment Specification
  • 405nm, 60mW SSD laser source
  • High resolution printing down to 0.6µm
  • Overlay accuracy up to 0.2 µm
  • Back to front side alignment
  • Substrate size up to 200mm by 200mm
Available Resists
Positive Resists:
  • Shipley S-1813
  • AZ-3312
  • SPR220-7.0
  • LOR-3A
  • PMGI SF5
  • PMGI SF11
Negative Resists:
  • MaN-1410
Training Material: