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Pulsed Laser Deposition
Located in VKNRC N116 the PVD products PLD/MBE-2500 Pulsed Laser Deposition (PLD) system is one of the facility thin film deposition systems. The system is a versatile high performance system which allows for deposition in ultra-high vacuum, an inert gas environment or in a reactive gas environment, such as oxygen which is commonly used when depositing oxides. The system has the many features including:
- Base pressure: ~ 1.5· 10 -8 Torr
- Laser raster
- 6 targets
- Target rotation, raster
- Substrate heating 950° C
- In-situ RHEED thickness monitor
- Load lock - 2 samples
- substrate rotation
- Combinatorial Films